Call Number (LC) Title Results
E 1.99: conf-931108--34 Dislocation loops in spinel crystals irradiated successively with deep and shallow ion implants 1
E 1.99: conf-931108--35 Fabrication and testing of plasma-spray formed MoSi{sub 2} and MoSi{sub 2} composite tubes 1
E 1.99: conf-931108--36 Electro-optic materials by solid source MOCVD 1
E 1.99: conf-931108--37 Gas-phase silicon atom densities in the chemical vapor deposition of silicon from silane 1
E 1.99: conf-931108--38 Analytical electron microscopy examination of solid reaction products in long-term test of SRL 200 waste glasses 1
E 1.99: conf-931108--39 Thermochemical data for CVD modeling from ab initio calculations 1
E 1.99:conf-931108--40 Ionic conduction mechanisms in CaF₂ and CaF₂-Al₂O₃ nanocomposite films on Al₂O₃ substrates 1
E 1.99: conf-931108--41 Surface chemistry of boron-doped SiO₂ CVD Enhanced uptake of tetraethyl orthosilicate by hydroxyl groups bonded to boron.
Ultra-smooth dry etching of GaAs using a hydrogen plasma pretreatment 		2
E 1.99: conf-931108--42 Ion damage studies in GaAs/Al{sub 0.6}Ga{sub 0.4}As/GaAs heterostructures
Performance of CVR coatings for PBR fuels 		2
E 1.99: conf-931108--43 Brittle composites modeling Comparisons with MoSi₂/ZrO₂
Direct measurement of the reactivity of NH and OH on a silicon nitride surface 		2
E 1.99:conf-931108--44 Characterization of thermally annealed Sb implanted fused silica 1
E 1.99: conf-931108--45 Waste glass weathering 1
E 1.99:conf-931108--45 Colloidal Au nanoclusters formed in fused silica by MeV ion implantation and annealing 1
E 1.99: conf-931108--46 Realtime structural electrochemistry of platinum clusters using dispersive XAFS
Ion beam-assisted deposition of boron nitride from a condensed layer of diborane and ammonia at 78 K 		2
E 1.99: conf-931108--47 ECR plasma synthesis of silicon nitride films on GaAs and InSb 1
E 1.99: conf-931108--48 The growth of InAsSb/InGaAs strained-layer superlattices by metal-organic chemical vapor deposition 1
E 1.99: conf-931108--49 The organometallic chemical vapor deposition of transition metal carbides The use of homoleptic alkyls. 1
E 1.99:conf-931108--50 Nanosize metal alloy particle formation in Ag and Cu sequentially implanted silica 1
E 1.99: conf-931108--51 Deposition of DLC via intense ion beam ablation 1
E 1.99:conf-931108--52 Oriented Si and Ge nanocrystals formed in Al₂O₃ by ion implantation and annealing 1