Call Number (LC) | Title | Results |
---|---|---|
TK7872.M25 S83 2022 | Power magnetic devices : a multi-objective design approach / | 1 |
TK7872.M25 T47 2011eb | Terahertz technology fundamentals and applications / | 1 |
TK7872.M25 V47 2009eb | Ultra-wideband pulse-based radio reliable communication over a wideband channel / | 1 |
TK7872.M3 |
Extreme ultraviolet (EUV) lithography 22-25 February 2010, San Jose, California, United States / Photomask Technology 2015. Alternative Lithographic Technologies VIII : 22-25 February 2016, San Jose, California, United States / Extreme Ultraviolet (EUV) Lithography VII : 22-25 February 2016, San Jose, California, United States / Extreme ultraviolet (EUV) lithography III 13-16 February 2012, San Jose, California, United States / Lithography : principles, processes and materials / Extreme ultraviolet (EUV) lithography II 28 February-3 March 2011, San Jose, California, United States / Optical lithography : here is why / EMLC 2008 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany / Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States / Nanolithography the art of fabricating nanoelectronics, nanophotonics and nanobiology devices and systems / Photomask and next-generation lithography mask technology XIX 17-19 April 2012, Yokohama, Japan / |
12 |
TK7872.M3 A38 2004 | Advanced microlithography technologies 8-10 November 2004, Beijing, China / | 1 |
TK7872.M3 A48 2010 | Alternative lithographic technologies II 23-25 February 2010, San Jose, California, United States / | 1 |
TK7872.M3 A48 2011e | Alternative lithographic technologies III 1-3 March 2011, San Jose, California, United States / | 1 |
TK7872.M3 A48 2012e | Alternative lithographic technologies IV 13-16 February 2012, San Jose, California, United States / | 1 |
TK7872.M3 A48 2013e | Alternative lithographic technologies V : 25-28 February 2013. San Jose, California, United States / | 1 |
TK7872.M3 A48 2015e | Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States / | 1 |
TK7872.M3 C66 2010 |
Computational lithography Computational lithography / |
3 |
TK7872.M3 E44 1985 | Integrated circuit mask technology / | 1 |
TK7872.M3 E8 | Magnetic amplifiers. | 1 |
TK7872.M3 E89 | European Conference on Mask Technology for Integrated Circuits and Microcomponents. | 1 |
TK7872.M3 E89 1998 | 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 16-17 November 1998, Munich-Unterhaching, Germany / | 1 |
TK7872.M3 E89 1999 | 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents 15-16 November 1999, Munich, Germany / | 1 |
TK7872.M3 E89 2004 | 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents 12-14 January 2004, Dresden, Germany / | 1 |
TK7872.M3 E97 2000 | 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents proceedings : 13-14 November 2000, Munich, Germany / | 1 |
TK7872.M3 E97 2002 | 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents proceedings : 15-16 January, 2002, Munich, Germany / | 1 |
TK7872.M3 E97 2003 | 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents 13-15 January, 2003, Sonthofen, Germany / | 1 |