André Anders
André Anders (born 1961) is a German-American experimental plasma physicist and materials scientist. He has been the director of the Leibniz Institute of Surface Engineering in Leipzig, Germany, since 2017. Previously, 1992-2017, he worked at Lawrence Berkeley National Laboratory, Berkeley, California. He is best known for his work on metal plasmas and thin film deposition by cathodic arcs and high power impulse magnetron sputtering. He was the Editor-in-Chief of Journal of Applied Physics (2014-2024) published by AIP Publishing. Provided by Wikipedia
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Cathodic arcs : from fractal spots to energetic condensation / by Anders, André
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High power impulse magnetron sputtering and related discharges Scalable plasma sources for plasma-based ion implantation and deposition. by Anders, Andre
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Cathodic arcs from fractal spots to energetic condensation / by Anders, André
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Size and composition-controlled fabrication of VO2 nanocrystals by terminated cluster growth by Anders, Andre, Slack, Jonathan
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Estimating electron drift velocities in magnetron discharges by Anders, Andre, Rauch, Albert
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Boron-rich plasma by high power impulse magnetron sputtering of lanthanum hexaboride by Anders, Andre, Oks, Efim, State University of Control Systems and
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Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas by Anders, Andre, Ni, Pavel, Andersson, Joakim, Centre for Quantum Technologies, Nationa
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Modeling of optical and energy performance of tungsten-oxide-based electrochromic windows including their intermediate states by Anders, Andre, Isidorsson, Jan, Lim, Sunnie H.N, Sun, Lizhong, Kwak, B. Leo
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Achieving high mobility ZnO Al at very high growth rates by dc filtered cathodic arc deposition. by Anders, Andre, Milliron, Delia, Lim, Sunnie, Zhu, YuanKun, Mendelsberg, Rueben, Wallig, Joe
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Improved structural and electrical properties of thin ZnO Al films by dc filtered cathodic arc deposition. by Zhu, Jiaqi, Han, Jiecai, Mendelsberg, Rueben J., Harbin Institute of Technology, Lim, Sunnie H.N, Zhu, Yuankun, Anders, André
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11
Propagation direction reversal of ionization zones in the transition between high and low current magnetron sputtering by Liu, Lin, Lawrence Berkeley National Laboratory, 1, School of Materials Science and Engineer, Department of Physics, University of Cal, Anders, André, Liu, Jason, Yang, Yuchen
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Dopant-induced band filling and bandgap renormalization in CdO In films. by Anders, Andre, Zhu, Jiaqi, Han, Jiecai, Materials Science Division, Argonne Nati, Mendelsberg, Rueben J., Zhu, Yuankun, Center for Composite Materials and Struc, Plasma Applications Group, Lawrence Berk
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Handbook of plasma immersion ion implantation and deposition /
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Related Subjects
Plasma Physics And Fusion Technology
Materials Science
Energy Conservation, Consumption, And Utilization
Plasma (Ionized gases)
Cathode rays
Intermittency (Nuclear physics)
Atomic And Molecular Physics
Condensed Matter Physics, Superconductivity And Superfluidity
Energy Planning, Policy, And Economy
Environmental Sciences
Finishing
Industrial applications
Ion bombardment
Ion implantation
Metals
Surfaces