PVD for microelectronics [electronic resource] : sputter deposition applied to semiconductor manufacturing / Ronald A. Powell, Stephen M. Rossnagel.
GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the dev...
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| Format: | Electronic eBook |
| Language: | English |
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San Diego :
Academic Press,
©1999.
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| Series: | Thin films (San Diego, Calif.) ;
v. 26. |
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Table of Contents:
- Useful Conversion Factors and Constants. Introduction. Physics of Sputtering. Plasma Systems. The Planar Magnetron. Sputtering Tools. Directional Deposition. Planarized PVD: Use of Elevated Temperature and/or High Pressure. Ionized Magnetron Sputter Deposition. PVD Materials and Processes. Process Modeling for Magnetron Deposition. Sputtering Targets. Index.