A user's guide to ellipsometry [electronic resource] / Harland G. Tompkins.
This book is specifically designed for the user who wishes expanded use of ellipsometry beyond the relatively limited number of turn-key applications. The book provides a concise discussion of theory and instrumentation before describing how to use optical parameters to determine material properties...
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| Format: | Electronic eBook |
| Language: | English |
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Boston :
Academic Press,
©1993.
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Table of Contents:
- Front Cover; A User's Guide to Ellipsometry; Copyright Page; Table of Contents; Preface; Chapter 1. Theoretical Aspects; 1.1 Description of an Electromagnetic Wave; 1.2 Interaction of Light with material; 1.3 Polarized Light; 1.4 Reflections; 1.5 Ellipsometry Definitions; 1.6 References; Chapter 2. Instrumentation; 2.1 Fundamentals and History; 2.2 Optical Elements; 2.3 The Manual Null Instrument; 2.4 Rotating Element Instruments; 2.5 References; Chapter 3. Using Optical Parameters to Determine Material Properties; 3.1 Del/Psi and n and k for Substrates.
- 3.2 The Calculation of Del/Psi Trajectories for Films on Substrates3.3 Trajectories for Transparent Films; 3.4 Trajectories for Absorbing Films; 3.5 Two-Film Structures; 3.6 References; Chapter 4. Determining Optical Parameters for Inaccessible substrates and Unknown Films; 4.1 Inaccessible Substrates and Unknown Films; 4.2 Determining Film-Free Values of Del and Psi; 4.3 Determining the Complex Index of Refraction of the Film; 4.4 Summary; 4.5 References; Chapter 5. Extremely Thin Films; 5.1 General Principles; 5.2 Some Examples of Extremely Thin Films; 5.3 Summary; 5.4 References.
- Chapter 6. The Special Case of Polysilicon6.1 General; 6.2 Range of the Optical Constants; 6.3 Del/Psi Trajectories in General; 6.4 Effect of the Coefficient of Extinction; 6.5 Effect of the Index of Refraction; 6.6 Requirements; 6.7 Measuring the Thickness of Oxide on Polysilicon; 6.8 Simplifications; 6.9 References; Chapter 7. The Effect of Roughness; 7.1 General; 7.2 Macroscopic Roughness; 7.3 Microscopic Roughness; 7.4 Perspective; 7.5 Substrate Roughness; 7.6 Film Growth with Roughness; 7.7 References; Part1: Case Studies; Case 1: Dissolution and Swelling of Thin Polymer Films.
- C1.1 GeneralC1.2 Early Work using a Psi-Meter; C1.3 Later Work using an Ellipsometer; C1.4 Modeling the Swollen Film; C1.5 Comparison of Data with Model; Cl. 6 References; Case 2: Ion Beam Interaction with Silicon; C2.1 General; C2.2 Development of the Analysis Method; C2.3 Ion Beam Damage Results; C2.4 Damage Removal; C2.5 References; Case 3: Dry Oxidation of Metals; C3.1 General; C3.2 Oxidation of Bismuth at Room Temperature; C3.3 Plasma Oxidation of Tantalum; C3.4 Thermal Oxidation of Nickel; C3.5 References; Case 4: Optical Properties of Sputtered Chromium Suboxide Thin Films; C4.1 General.
- C4.2 Film Preparation and Auger AnalysisC4.3 Optical Measurements; C4.4 Reference; Case 5: Ion-Assisted Film Growth of Zirconium Dioxide; C5.1 Experimental Apparatus; C5.2 Optical Measurements; C5.3 References; Case 6: Electrochemical/Ellipsometric Studies of Oxides on Metals; C6.1 General; C6.2 Experimental Methods; C6.3 Oxide Growth: 1. Zirconium; C6.4 Oxide Growth: 2. Titanium; C6.5 Oxide Growth: 3. Vanadium; C6.6 Deposition of Oxides: 1. Lead; C6.7 Deposition of Oxides: 2. Manganese; C6.8 References; Case 7: Amorphous Hydrogenated Carbon Films; C7.1 General.