Physics of thin films : advances in research and development. Vol. 6 / guest editors Maurice H. Francombe and Richard W. Hoffman.
Physics of Thin Films: Advances in Research and Development, Volume 6 reviews the rapid progress that has been made in research and development concerning the physics of thin films, with emphasis on metallic films. Topics covered include anodic oxide films, thin metal films and wires, and multilayer...
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| Online Access: |
Full Text (via ScienceDirect) |
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| Other Authors: | , |
| Format: | eBook |
| Language: | English |
| Published: |
New York ; London :
Academic Press,
1971.
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| Subjects: |
| Summary: | Physics of Thin Films: Advances in Research and Development, Volume 6 reviews the rapid progress that has been made in research and development concerning the physics of thin films, with emphasis on metallic films. Topics covered include anodic oxide films, thin metal films and wires, and multilayer magnetic films. This volume is comprised of five chapters and begins with a discussion on the dielectric properties and the technique of plasma anodization which are relevant to the applications of anodic oxide films in electronic devices. Conduction, polarization, and dielectric breakdown effects. |
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| Physical Description: | 1 online resource (xiv, 370 pages) : illustrations. |
| Bibliography: | REFERENCESChapter 5. Diffusion in Metallic Films; I. Introduction; II. Metal Systems; III. Experimental Methods; Iv. Experimental Results; V. Conclusions; REFERENCES; Author Index; Subject Index. |
| ISBN: | 9781483144931 1483144933 |
| Source of Description, Etc. Note: | Print version record. |