Advances in low temperature rf plasmas : basis for process design / edited by T. Makabe.
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| Other Authors: | |
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| Format: | Book |
| Language: | English |
| Published: |
Amsterdam ; Boston :
North Holland/Elsevier,
2002.
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| Edition: | 1st ed. |
| Subjects: |
PASCAL Offsite
| Call Number: |
TA2020 .A63 2002
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|---|---|
| TA2020 .A63 2002 | Available Place a Hold |