In-line methods and monitors for process and yield improvement [electronic resource] : 22-23 September 1999, Santa Clara, California / Sergio Ajuria, Jerome F. Jakubczak, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, the Electrochemical Society [and others]

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Society of Photo-Optical Instrumentation Engineers, Electrochemical Society, SPIE Digital Library
Other Authors:	Ajuria, Sergio, Jakubczak, Jerome Florian
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash., USA : SPIE, ©1999.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3884.
Subjects:	Semiconductors > Design and construction > Congresses. Integrated circuits > Design and construction > Congresses. Optical pattern recognition > Industrial applications > Congresses. Manufacturing processes > Congresses. Integrated circuits > Design and construction. Manufacturing processes. Optical pattern recognition > Industrial applications. Semiconductors > Design and construction. Conference papers and proceedings.

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Call Number:	TK7871.85 .I486 1999
TK7871.85 .I486 1999	Available