In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II [electronic resource] : 31 May-1 June 2001, Edinburgh, UK / Gudrun Kissinger, Larg H. Weiland, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Society of Photo-Optical Instrumentation Engineers, Scottish Enterprise, European Optical Society, Institution of Electrical Engineers, SPIE Digital Library
Other Authors:	Kissinger, Gudrun, Weiland, Larg H.
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash. : SPIE, ©2001.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 4406.
Subjects:	Integrated circuits > Very large scale integration > Design and construction > Congresses. Semiconductors > Design and construction > Congresses. Manufacturing processes > Congresses. Microelectronics > Materials > Congresses. Integrated circuits > Very large scale integration > Design and construction. Manufacturing processes. Microelectronics > Materials. Semiconductors > Design and construction. Conference papers and proceedings.

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Call Number:	TK7874.75 .I445 2001
TK7874.75 .I445 2001	Available