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Solid state laser driver for Extreme Ultraviolet Lithography. Revision 1 [electronic resource]

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Bibliographic Details
Online Access: Online Access
Corporate Author: Lawrence Livermore National Laboratory (Researcher)
Format: Government Document Electronic eBook
Language:English
Published: Washington, D.C. : Oak Ridge, Tenn. : United States. Dept. of Energy ; distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy, 1994.
Subjects:
Testing.
Semiconductor Lasers.
Solid State Lasers.
Extreme Ultraviolet Radiation.
Optical Scanners.
Power Amplifiers.
Fabrication.
Integrated Circuits.
Oscillators.
Engineering.
Description
Abstract:We describe the design and initial performance of a Nd:YAG laser master oscillator/phase conjugated power amplifier as a driver for extreme ultraviolet lithography. The design provides 0.5 to 1 joule per pulse with about 5 ns pulse width and excellent beam quality up through 1.5 kHz repetition frequency.
Item Description:Published through the Information Bridge: DOE Scientific and Technical Information.
05/01/1994.
"ucrl-jc--117000-rev.1"
"DE94016971"
Hackel, L.A.; Zapata, L.E.; Reichert, P.; Honig, J.
Physical Description:6 p. : digital, PDF file.
Type of Report and Period Covered Note:Topical;

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