Standards for organic contaminant thickness measurement by the ellipsometer [electronic resource]
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| Online Access: |
Online Access |
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| Format: | Government Document Electronic eBook |
| Language: | English |
| Published: |
Oak Ridge, Tenn. :
distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy,
1981.
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| Subjects: |
| Abstract: | No film thickness standards have been established for the ellipsometer that can be used for determining the thickness of organic contaminants on electrical components. Thickness measurement of organic contamination on a surface is dependent on the refractive index of the film; knowledge of the refractive index of the film is required before thickness measurements can be made. Silicon oxide has a refractive index equivalent to most organic materials. Silicon oxide, therefore, can be used for developing thickness standards for use in ellipsometer measurement of organic film contamination. A film thickness standard curve was established by correlating known silicon oxide thicknesses with their corresponding phase change (delta, an optical constant of the surface). Thickness standards up to 2700 A were established. |
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| Item Description: | Published through SciTech Connect. 03/01/1981. "bdx-613-2592" Jackson, L.C. Bendix Corp., Kansas City, MO (USA) |