Process technology for semiconductor lasers [electronic resource] : crystal growth and microprocesses / Kenichi Iga, Susumu Kinoshita.
Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. Starting out with the history of semiconductor-laser development and applications the materials for use in lasing from short to long wavelengths are reviewe...
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Format: | Electronic eBook |
Language: | English |
Published: |
Berlin ; New York :
Springer,
©1996.
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Series: | Springer series in materials science ;
v. 30. |
Subjects: |
MARC
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100 | 1 | |a Iga, Kenʼichi, |d 1940- |0 http://id.loc.gov/authorities/names/n81141563 |1 http://isni.org/isni/0000000110304401. | |
245 | 1 | 0 | |a Process technology for semiconductor lasers |h [electronic resource] : |b crystal growth and microprocesses / |c Kenichi Iga, Susumu Kinoshita. |
260 | |a Berlin ; |a New York : |b Springer, |c ©1996. | ||
300 | |a 1 online resource (x, 169 pages) : |b illustrations. | ||
336 | |a text |b txt |2 rdacontent. | ||
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347 | |a text file. | ||
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490 | 1 | |a Springer series in materials science ; |v 30. | |
504 | |a Includes bibliographical references (pages 155-166) and index. | ||
505 | 0 | 0 | |g 1. |t Introduction -- |g 2. |t Materials for Semiconductor Lasers -- |g 3. |t Basic Design of Semiconductor Lasers -- |g 4. |t Epitaxy of III-V Compound Semiconductors -- |g 5. |t Liquid Phase Epitaxy and Growth Technology -- |g 6. |t Vapor Phase and Beam Epitaxies -- |g 7. |t Characterization of Laser Materials -- |g 8. |t Semiconductor-Laser Devices -- Fabrication and Characteristics -- |g 9. |t Mode Control Techniques in Semiconductor Lasers -- |g 10. |t Surface-Emitting Lasers. |
520 | |a Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. Starting out with the history of semiconductor-laser development and applications the materials for use in lasing from short to long wavelengths are reviewed. The basic design principles for semiconductor- laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies, respectively. The characterizations of laser materials, and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter. | ||
588 | 0 | |a Print version record. | |
650 | 0 | |a Semiconductor lasers |x Design and construction. | |
650 | 0 | |a Laser materials. |0 http://id.loc.gov/authorities/subjects/sh85074779. | |
650 | 0 | |a Crystal growth. |0 http://id.loc.gov/authorities/subjects/sh85034507. | |
650 | 0 | |a Epitaxy. |0 http://id.loc.gov/authorities/subjects/sh85044462. | |
650 | 7 | |a Crystal growth. |2 fast |0 (OCoLC)fst00884619. | |
650 | 7 | |a Epitaxy. |2 fast |0 (OCoLC)fst00914372. | |
650 | 7 | |a Laser materials. |2 fast |0 (OCoLC)fst00992815. | |
650 | 7 | |a Semiconductor lasers |x Design and construction. |2 fast |0 (OCoLC)fst01112171. | |
700 | 1 | |a Kinoshita, Susumu, |d 1959- |0 http://id.loc.gov/authorities/names/n95107845 |1 http://isni.org/isni/0000000083550219. | |
776 | 0 | 8 | |i Print version: |a Iga, Kenʼichi, 1940- |t Process technology for semiconductor lasers. |d Berlin ; New York : Springer, ©1996 |w (DLC) 95048999 |w (OCoLC)33440558. |
830 | 0 | |a Springer series in materials science ; |v v. 30. |0 http://id.loc.gov/authorities/names/n86740676. | |
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