Process technology for semiconductor lasers [electronic resource] : crystal growth and microprocesses / Kenichi Iga, Susumu Kinoshita.

Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. Starting out with the history of semiconductor-laser development and applications the materials for use in lasing from short to long wavelengths are reviewe...

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Bibliographic Details
Online Access: Full Text (via Springer)
Main Author: Iga, Kenʼichi, 1940-
Other Authors: Kinoshita, Susumu, 1959-
Format: Electronic eBook
Language:English
Published: Berlin ; New York : Springer, ©1996.
Series:Springer series in materials science ; v. 30.
Subjects:

MARC

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245 1 0 |a Process technology for semiconductor lasers  |h [electronic resource] :  |b crystal growth and microprocesses /  |c Kenichi Iga, Susumu Kinoshita. 
260 |a Berlin ;  |a New York :  |b Springer,  |c ©1996. 
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490 1 |a Springer series in materials science ;  |v 30. 
504 |a Includes bibliographical references (pages 155-166) and index. 
505 0 0 |g 1.  |t Introduction --  |g 2.  |t Materials for Semiconductor Lasers --  |g 3.  |t Basic Design of Semiconductor Lasers --  |g 4.  |t Epitaxy of III-V Compound Semiconductors --  |g 5.  |t Liquid Phase Epitaxy and Growth Technology --  |g 6.  |t Vapor Phase and Beam Epitaxies --  |g 7.  |t Characterization of Laser Materials --  |g 8.  |t Semiconductor-Laser Devices -- Fabrication and Characteristics --  |g 9.  |t Mode Control Techniques in Semiconductor Lasers --  |g 10.  |t Surface-Emitting Lasers. 
520 |a Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. Starting out with the history of semiconductor-laser development and applications the materials for use in lasing from short to long wavelengths are reviewed. The basic design principles for semiconductor- laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies, respectively. The characterizations of laser materials, and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter. 
588 0 |a Print version record. 
650 0 |a Semiconductor lasers  |x Design and construction. 
650 0 |a Laser materials.  |0 http://id.loc.gov/authorities/subjects/sh85074779. 
650 0 |a Crystal growth.  |0 http://id.loc.gov/authorities/subjects/sh85034507. 
650 0 |a Epitaxy.  |0 http://id.loc.gov/authorities/subjects/sh85044462. 
650 7 |a Crystal growth.  |2 fast  |0 (OCoLC)fst00884619. 
650 7 |a Epitaxy.  |2 fast  |0 (OCoLC)fst00914372. 
650 7 |a Laser materials.  |2 fast  |0 (OCoLC)fst00992815. 
650 7 |a Semiconductor lasers  |x Design and construction.  |2 fast  |0 (OCoLC)fst01112171. 
700 1 |a Kinoshita, Susumu,  |d 1959-  |0 http://id.loc.gov/authorities/names/n95107845  |1 http://isni.org/isni/0000000083550219. 
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