Computational lithography / Xu Ma and Gonzalo R. Arce.
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since t...
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Full Text (via O'Reilly/Safari) |
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| Format: | eBook |
| Language: | English |
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Hoboken, N.J. :
Wiley,
©2010.
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| Series: | Wiley series in pure and applied optics.
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Internet
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| Call Number: |
TK7872.M3 C66 2010
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| TK7872.M3 C66 2010 | Available |