Ionized physical vapor deposition [electronic resource] / edited by Jeffrey A. Hopwood.

This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet th...

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Bibliographic Details

Online Access:	Full Text (via ScienceDirect)
Other Authors:	Hopwood, Jeffrey A.
Format:	Electronic eBook
Language:	English
Published:	San Diego : Academic Press, ©2000.
Series:	Thin films (San Diego, Calif.) ; v. 27.
Subjects:	Thin film devices > Design and construction. Physical vapor deposition. Thin films.