Microlithography : science and technology / edited by Bruce W. Smith and Kazuaki Suzuki.
"Like the bestselling original, this third edition of Microlithography is a self-contained text detailing both elementary and advanced aspects of submicron microlithography, offering a balanced treatment of theoretical and operating practices"--
Saved in:
| Online Access: |
Full Text (via Taylor & Francis) |
|---|---|
| Other Authors: | , |
| Format: | eBook |
| Language: | English |
| Published: |
Boca Raton :
CRC Press,
2020.
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| Edition: | Third edition. |
| Subjects: |
MARC
| LEADER | 00000cam a2200000xi 4500 | ||
|---|---|---|---|
| 001 | b12795376 | ||
| 003 | CoU | ||
| 006 | m o d | ||
| 007 | cr ||||||||||| | ||
| 008 | 200512s2020 flu ob 000 0 eng d | ||
| 005 | 20230925210139.4 | ||
| 019 | |a 1226072274 | ||
| 020 | |a 9781315117171 |q (electronic bk.) | ||
| 020 | |a 1315117177 |q (electronic bk.) | ||
| 020 | |a 9781439876763 |q (electronic bk. ; |q PDF) | ||
| 020 | |a 1439876762 |q (electronic bk. ; |q PDF) | ||
| 020 | |a 9781351633949 |q (electronic bk. ; |q Mobipocket) | ||
| 020 | |a 1351633945 |q (electronic bk. ; |q Mobipocket) | ||
| 020 | |a 9781351643443 |q (electronic bk. ; |q EPUB) | ||
| 020 | |a 1351643444 |q (electronic bk. ; |q EPUB) | ||
| 020 | |z 9781439876756 | ||
| 020 | |z 1439876754 | ||
| 035 | |a (OCoLC)crc1154017316 | ||
| 035 | |a (OCoLC)1154017316 |z (OCoLC)1226072274 | ||
| 037 | |a crc9781315117171 | ||
| 040 | |a TYFRS |b eng |e rda |e pn |c TYFRS |d TYFRS |d N$T |d OCLCQ |d OCLCO |d K6U |d OCLCO | ||
| 049 | |a GWRE | ||
| 050 | 4 | |a TK7836 | |
| 245 | 0 | 0 | |a Microlithography : |b science and technology / |c edited by Bruce W. Smith and Kazuaki Suzuki. |
| 250 | |a Third edition. | ||
| 264 | 1 | |a Boca Raton : |b CRC Press, |c 2020. | |
| 300 | |a 1 online resource. | ||
| 336 | |a text |b txt |2 rdacontent. | ||
| 337 | |a computer |b c |2 rdamedia. | ||
| 338 | |a online resource |b cr |2 rdacarrier. | ||
| 545 | 0 | |a Bruce W. Smith is a Distinguished Professor of engineering at the Rochester Institute of Technology. He has been involved in teaching and research in microelectronic and microsystems engineering for over 35 years. His areas of research include semiconductor processing, deep ultraviolet (DUV), vacuum ultraviolet (VUV), immersion, and extreme ultraviolet (EUV) lithography, thin films, optics, and microelectronic materials. He has authored over 250 technical publications, given over 100 technical talks, and received over 25 patents, licensing his technology both nationally and internationally. He has worked extensively with individuals and organizations in the semiconductor industry, including industrial partners in the Semiconductor Research Corporation, SEMATECH, and the IMEC. He is the recipient of numerous teaching and research awards, including the Institute of Electrical and Electronics Engineers (IEEE) Technical Excellence Award, the American Vacuum Society (AVS) Excellence in Leadership Award, the Society for Photo-optical Instrumentation Engineers (SPIE) Research Mentoring Award, and the Rochester Institute of Technology Trustees Scholarship Award. He has also been inducted into the Rochester Institute of Technology Innovator Hall of Fame. Professor Smith is a Fellow of the Institute of Electrical and Electronics Engineers, the Optical Society of America, and the Society for Photo-optical Instrumentation Engineers. Kazuaki Suzuki majored in plasma physics and X-ray astronomy in the University of Tokyo, Japan. He has been a project manager for developing new concept exposure tools at Nikon Corporation, such as the early-generation KrF excimer laser stepper, the first-generation KrF excimer laser scanner, the electron beam projection exposure system, and the full-field extreme ultraviolet scanner. He received his Ph. D. in Precision Engineering from the University of Tokyo about the system design of exposure tools for microlithography. He has authored and coauthored many papers in the field of exposure tool and related technologies, including advanced equipment control by using metrology data. He also holds numerous patents in the same field. In the first decade of this century, he was a member of the program committee of the Society for Photo-optical Instrumentation Engineers (SPIE) Microlithography and other international conferences such as Micro & Nano Engineering in Europe and the International Microprocesses and Nanotechnology Conference in Japan. He was one of the associate editors of Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) from 2002 to 2009. He moved to Tokyo Tech Academy for Convergence of Materials and Informatics at Tokyo Institute of Technology (Tokyo Tech) in March 2019. | |
| 504 | |a Includes bibliographical references. | ||
| 520 | |a "Like the bestselling original, this third edition of Microlithography is a self-contained text detailing both elementary and advanced aspects of submicron microlithography, offering a balanced treatment of theoretical and operating practices"-- |c Provided by publisher. | ||
| 588 | 0 | |a Print version record. | |
| 650 | 0 | |a Microlithography |x Industrial applications. | |
| 650 | 0 | |a Integrated circuits |x Masks. |0 http://id.loc.gov/authorities/subjects/sh85067122. | |
| 650 | 0 | |a Metal oxide semiconductors, Complementary |x Design and construction. |0 http://id.loc.gov/authorities/subjects/sh2008107701. | |
| 650 | 0 | |a Manufacturing processes. |0 http://id.loc.gov/authorities/subjects/sh85080664. | |
| 650 | 7 | |a Integrated circuits |x Masks. |2 fast |0 (OCoLC)fst00975575. | |
| 650 | 7 | |a Manufacturing processes. |2 fast |0 (OCoLC)fst01008139. | |
| 650 | 7 | |a Metal oxide semiconductors, Complementary |x Design and construction. |2 fast |0 (OCoLC)fst01017641. | |
| 650 | 7 | |a Microlithography |x Industrial applications. |2 fast |0 (OCoLC)fst01019884. | |
| 700 | 1 | |a Smith, Bruce W., |d 1959- |e editor. |0 http://id.loc.gov/authorities/names/n98025307 |1 http://isni.org/isni/0000000110363620. | |
| 700 | 1 | |a Suzuki, Kazuaki, |e editor. |0 http://id.loc.gov/authorities/names/n2006073307 |1 http://isni.org/isni/0000000116743800. | |
| 776 | 0 | 8 | |i Print version: |t Microlithography. |b Third edition. |d Boca Raton : CRC Press, 2020 |z 9781439876756 |w (DLC) 2019053732 |w (OCoLC)1130322333. |
| 856 | 4 | 0 | |u https://colorado.idm.oclc.org/login?url=https://www.taylorfrancis.com/books/9781315117171 |z Full Text (via Taylor & Francis) |
| 907 | |a .b127953760 |b 11-01-22 |c 10-12-22 | ||
| 915 | |a - | ||
| 998 | |a web |b 10-31-22 |c b |d b |e - |f eng |g flu |h 0 |i 1 | ||
| 907 | |a .b127953760 |b 10-31-22 |c 10-12-22 | ||
| 944 | |a MARS | ||
| 956 | |a EngNetBase | ||
| 956 | |b Taylor & Francis ENGnetBASE | ||
| 999 | f | f | |i f4694fa8-3c60-5093-8ac5-1246279fcce4 |s 6bcdf989-5973-5f1b-9de7-ba039c17ac78 |
| 952 | f | f | |p Can circulate |a University of Colorado Boulder |b Online |c Online |d Online |e TK7836 |h Library of Congress classification |i web |n 1 |