Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California / Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
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| Corporate Author: | |
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| Other Authors: | |
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Wash., USA :
SPIE--the International Society for Optical Engineering,
©1984.
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 471. |
| Subjects: |
PASCAL Offsite
| Call Number: |
TK7874 .E482 1984
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| TK7874 .E482 1984 | Available Place a Hold |