Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.

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Bibliographic Details
Main Author:	Tandon, U. S., 1952-
Other Authors:	Khokle, W. S.
Format:	Book
Language:	English
Published:	New York : J. Wiley, 1993.
Subjects:	Integrated circuits > Masks. Ion beam lithography. Lithography, Electron beam. X-ray lithography.

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Holdings details from PASCAL Offsite
Call Number:	TK7872.M3 P38 1993
TK7872.M3 P38 1993	Available Place a Hold