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CoU |
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921028s1993 nyua b 001 0 eng |
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20240722202314.7 |
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|a 92036072
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|a 0470220635 (J. Wiley)
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|a 8122405614 (Wiley Eastern)
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|a (OCoLC)ocm27036323
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|a DLC
|c DLC
|d UKM
|d COD
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|a CODI
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|a TK7872.M3
|b P38 1993
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100 |
1 |
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|a Tandon, U. S.,
|d 1952-
|0 http://id.loc.gov/authorities/names/n92107015.
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245 |
1 |
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|a Patterning of material layers in submicron region /
|c U.S. Tandon, W.S. Khokle.
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260 |
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|a New York :
|b J. Wiley,
|c 1993.
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300 |
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|a xii, 183 pages :
|b illustrations (some color) ;
|c 25 cm.
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336 |
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|a text
|b txt
|2 rdacontent.
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337 |
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|a unmediated
|b n
|2 rdamedia.
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338 |
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|a volume
|b nc
|2 rdacarrier.
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590 |
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|a ENGINE c.1 kw.
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504 |
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|a Includes bibliographical references and index.
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583 |
1 |
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|a committed to retain
|c 20240101
|d 2049101
|5 CoU
|f Alliance Shared Trust
|u https://www.coalliance.org/shared-print-archiving-policies
|
650 |
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|a Integrated circuits
|x Masks.
|0 http://id.loc.gov/authorities/subjects/sh85067122.
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650 |
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|a Ion beam lithography.
|0 http://id.loc.gov/authorities/subjects/sh85067791.
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650 |
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|a Lithography, Electron beam.
|0 http://id.loc.gov/authorities/subjects/sh85077608.
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650 |
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|a X-ray lithography.
|0 http://id.loc.gov/authorities/subjects/sh85148736.
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700 |
1 |
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|a Khokle, W. S.
|0 http://id.loc.gov/authorities/names/n89223438.
|
907 |
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|a .b20330431
|b 02-23-21
|c 02-27-95
|
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|a eng
|b 02-27-95
|c -
|d m
|e -
|f eng
|g nyu
|h 0
|i 1
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907 |
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|a .b20330431
|b eng
|c -
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907 |
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|a .b20330431
|b 10-25-18
|c 02-27-95
|
944 |
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|a MARS - RDA ENRICHED
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907 |
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|a .b20330431
|b 12-17-08
|c 02-27-95
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|a .b20330431
|b 04-03-96
|c 02-27-95
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f |
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|i 50774e2a-1add-5b93-ad2b-e65fa258778a
|s 4d922ca4-7221-5eb3-8693-ed77e8cbd71c
|
952 |
f |
f |
|p Can circulate
|a University of Colorado Boulder
|b Boulder Campus
|c Offsite
|d PASCAL Offsite
|e TK7872.M3 P38 1993
|h Library of Congress classification
|i book
|m P204342813012
|n 1
|