Effect of argon and hydrogen on deposition of silicon from tetrachlorosilane in cold plasmas [microform] / R.R. Manory, R. Avni and A. Grill.

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Bibliographic Details
Main Author: Manory, R. R.
Corporate Author: United States. National Aeronautics and Space Administration
Other Authors: Avni, Reuven, Grill, Alfred
Format: Government Document Microfilm Book
Language:English
Published: [Washington, D.C.] : [Springfield, Va.] : National Aeronautics and Space Administration ; [For sale by the National Technical Information Service], [1985]
Series:NASA technical memorandum ; 87219.
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Norlin Library - Government Information - Microform

Holdings details from Norlin Library - Government Information - Microform
Call Number: NAS 1.15:87219
NAS 1.15:87219 Restricted Place a Hold