Effect of argon and hydrogen on deposition of silicon from tetrachlorosilane in cold plasmas [microform] / R.R. Manory, R. Avni and A. Grill.
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Format: | Government Document Microfilm Book |
Language: | English |
Published: |
[Washington, D.C.] : [Springfield, Va.] :
National Aeronautics and Space Administration ; [For sale by the National Technical Information Service],
[1985]
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Series: | NASA technical memorandum ;
87219. |
Subjects: |
Norlin Library - Government Information - Microform
Call Number: |
NAS 1.15:87219
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NAS 1.15:87219 | Restricted Place a Hold |