Effect of argon and hydrogen on deposition of silicon from tetrachlorosilane in cold plasmas [microform] / R.R. Manory, R. Avni and A. Grill.

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Bibliographic Details
Main Author:	Manory, R. R.
Corporate Author:	United States. National Aeronautics and Space Administration
Other Authors:	Avni, Reuven, Grill, Alfred
Format:	Government Document Microfilm Book
Language:	English
Published:	[Washington, D.C.] : [Springfield, Va.] : National Aeronautics and Space Administration ; [For sale by the National Technical Information Service], [1985]
Series:	NASA technical memorandum ; 87219.
Subjects:	Low temperature plasmas. Silicon.

Norlin Library - Government Information - Microform

Holdings details from Norlin Library - Government Information - Microform
Call Number:	NAS 1.15:87219
NAS 1.15:87219	Restricted Place a Hold