In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas / Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored ... by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, [and] The Electrochemical Society.

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Bibliographic Details
Corporate Authors: Society of Photo-Optical Instrumentation Engineers, Semiconductor Equipment and Materials International, Solid State Technology Center (RCA Corporation), Electrochemical Society
Other Authors: DeBusk, Damon, Ajuria, Sergio
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE, ©1997.
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3215.
Subjects:

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Call Number: TK7871.85 .I48 1997
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