In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas / Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored ... by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, [and] The Electrochemical Society.
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| Corporate Authors: | , , , |
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| Other Authors: | , |
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Wash., USA :
SPIE,
©1997.
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 3215. |
| Subjects: |
| Physical Description: | v, 186 pages : illustrations ; 28 cm. |
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| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0819426474 |
| Action Note: | committed to retain |