Plasma etching : fundamentals and applications / M. Sugawara ; with contributions from Barry L. Stonsfield [and others]
Saved in:
| Main Author: | |
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| Other Authors: | |
| Format: | Book |
| Language: | English |
| Published: |
New York :
Oxford University Press,
1998.
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| Series: | Series on semiconductor science and technology ;
7. |
| Subjects: |
Closed Stacks - Engineering Math & Physics Library - Stacks
| Call Number: |
TK7871.85 .S88 1998
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|---|---|
| TK7871.85 .S88 1998 | Withdrawn |
| TK7871.85 .S88 1998 | Available Place a Hold |