Optical microlithography XI [electronic resource] : 25-27 February, 1998, Santa Clara, California / Luc Van den Hove, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Society of Photo-Optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SEMATECH (Organization), SPIE Digital Library
Other Authors:	Van den Hove, Luc
Other title:	Optical microlithography 11. Opticl microlithography eleven.
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash. : SPIE, ©1998.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3334.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses. X-ray lithography > Congresses. Manufacturing processes > Congresses. Integrated circuits > Masks. Manufacturing processes. Microlithography. X-ray lithography. Conference papers and proceedings.

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Call Number:	TK7872.M3 O68 1998
TK7872.M3 O68 1998	Available