Metrology, inspection, and process control for microlithography XIV [electronic resource] : 28 February-2 March, 2000, Santa Clara, California / Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Society of Photo-Optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, SPIE Digital Library
Other Authors:	Sullivan, Neal T.
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash. : SPIE, ©2000.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3998.
Subjects:	Integrated circuits > Inspection > Congresses. Integrated circuits > Measurement > Congresses. Microlithography > Congresses. Process control > Congresses. Integrated circuits > Inspection. Integrated circuits > Measurement. Microlithography. Process control. Conference papers and proceedings.

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Call Number:	TK7874 .I5554 2000
TK7874 .I5554 2000	Available