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|a TK7871.85
|b .I486 1999
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|a In-line methods and monitors for process and yield improvement
|h [electronic resource] :
|b 22-23 September 1999, Santa Clara, California /
|c Sergio Ajuria, Jerome F. Jakubczak, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, the Electrochemical Society [and others]
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| 260 |
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|a Bellingham, Wash., USA :
|b SPIE,
|c ©1999.
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| 300 |
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|a ix, 334 pages :
|b illustrations ;
|c 28 cm.
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| 336 |
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|a text
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|2 rdacontent.
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| 337 |
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|a computer
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|a SPIE proceedings series ;
|v v. 3884.
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| 504 |
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|a Includes bibliographical references and index.
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| 650 |
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0 |
|a Semiconductors
|x Design and construction
|v Congresses.
|0 http://id.loc.gov/authorities/subjects/sh2008111516.
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| 650 |
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|a Integrated circuits
|x Design and construction
|v Congresses.
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| 650 |
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|a Optical pattern recognition
|x Industrial applications
|v Congresses.
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|a Manufacturing processes
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|v v. 3884.
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