Photomask and next-generation lithography mask technology VIII [electronic resource] : 25-26 April 2001, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics [and others] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, Semiconductor Equipment and Materials International (Japan), Society of Photo-Optical Instrumentation Engineers, SPIE Digital Library
Other Authors:	Kawahira, Hiroichi
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash., USA : SPIE, ©2001.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 4409.
Subjects:	Masks (Electronics) > Congresses. Integrated circuits > Masks > Congresses. X-ray lithography > Congresses. Microlithography > Congresses. Optoelectronic devices > Design and construction > Congresses. Integrated circuits > Masks. Masks (Electronics) Microlithography. Optoelectronic devices > Design and construction. X-ray lithography. Conference papers and proceedings.

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Call Number:	TK7872.M3 P46 2001
TK7872.M3 P46 2001	Available