Optical microlithography XV [electronic resource] : 5-8 March, 2002, Santa Clara, [California], USA / Anthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Society of Photo-Optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors:	Yen, Anthony
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Washington SPIE, ©2002.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 4691.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses. X-ray lithography > Congresses. Manufacturing processes > Congresses. Integrated circuits > Masks. Manufacturing processes. Microlithography. X-ray lithography. Conference papers and proceedings.

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Call Number:	TK7835 .O664 2002eb
TK7835 .O664 2002eb	Available