Optical microlithography XV [electronic resource] : 5-8 March, 2002, Santa Clara, [California], USA / Anthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Saved in:
| Online Access: |
Full Text (via SPIE Digital Library) |
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| Corporate Authors: | , , |
| Other Authors: | |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Bellingham, Washington SPIE,
©2002.
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 4691. |
| Subjects: |
| Physical Description: | 1 online resource (2 volumes) : illustrations (some color) |
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| Bibliography: | Includes bibliographical references and author index. |
| Source of Description, Etc. Note: | Source of description: Print version record. |