Optical microlithography X [electronic resource] : 12-14 March, 1997, Santa Clara, California / Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Society of Photo-Optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SEMATECH (Organization), SPIE Digital Library
Other Authors:	Fuller, Gene E.
Other title:	Optical microlithography 10. Optical microlithography ten.
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash. : SPIE, ©1997.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3051.
Subjects:	Microlithography > Congresses. Integrated circuits > Masks > Congresses. X-ray lithography > Congresses. Manufacturing processes > Congresses. Integrated circuits > Masks. Manufacturing processes. Microlithography. X-ray lithography. Conference papers and proceedings.

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Call Number:	TK7835 .O662 1997
TK7835 .O662 1997	Available