In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing [electronic resource] : 1-2 October 1997, Austin, Texas / Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, the Electrochemical Society.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Society of Photo-Optical Instrumentation Engineers, Semiconductor Equipment and Materials International, Solid State Technology (Organization), Electrochemical Society, SPIE Digital Library
Other Authors:	DeBusk, Damon, Ajuria, Sergio
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash., USA : SPIE, ©1997.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3215.
Subjects:	Integrated circuits > Design and construction > Congresses. Semiconductors > Design and construction > Congresses. Optical pattern recognition > Congresses. Manufacturing processes > Congresses. Integrated circuits > Design and construction. Manufacturing processes. Optical pattern recognition. Semiconductors > Design and construction. Conference papers and proceedings.

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Call Number:	TK7871.85 .I485 1997
TK7871.85 .I485 1997	Available