Submicrometer metallization [electronic resource] : the challenges, opportunities, and limitations : 23-25 September 1992, San Jose, California / Thomas Kwok, Takamaro Kikkawa, Krishna Shenai, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Society of Photo-Optical Instrumentation Engineers, SPIE Digital Library
Other Authors:	Kwok, Thomas, Kikkawa, Takamaro, Shenai, Krishna
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash. : SPIE, ©1993.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1805.
Subjects:	Integrated circuits > Design and construction > Congresses. Metallic films > Congresses. Metallizing > Congresses. Electrodiffusion > Congresses. Semiconductor-metal boundaries > Congresses. Electrodiffusion. Integrated circuits > Design and construction. Metallic films. Metallizing. Semiconductor-metal boundaries. Conference papers and proceedings.

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Holdings details from Online
Call Number:	TK7874 .S848 1993
TK7874 .S848 1993	Available