Optical microlithography XVIII [electronic resource] : 1-4 March, 2005, San Jose, California, USA / Bruce W. Smith, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Society of Photo-Optical Instrumentation Engineers, International SEMATECH, SPIE Digital Library
Other Authors:	Smith, Bruce W., 1959-
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash. : SPIE, ©2005.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 5754.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses. X-ray lithography > Congresses. Manufacturing processes > Congresses. Integrated circuits > Masks. Manufacturing processes. Microlithography. X-ray lithography. Conference papers and proceedings.

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Call Number:	TK7835 .O65 2005
TK7835 .O65 2005	Available