Physics and chemistry in the process of hot-wire deposition of thin film silicon / by Wengang Zheng.
Hotwire Chemical Vapor Deposition (CVD) has been used in preparing high quality low hydrogen content hydrogenated amorphous or polycrystalline silicon thin film in recent years. Comparing to the most commonly used glow discharge method, Hotwire CVD has the potential of high speed deposition avoiding...
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| Format: | Thesis Book |
| Language: | English |
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2005.
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T 2005 .Z638
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