EMLC 2008 [electronic resource] : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany / Uwe F.W. Behringer, chair/editor ; Wilhelm Maurer, Jacques Waelpoel, program chairs ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS [and others]

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	European Mask and Lithography Conference Dresden, Germany, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik, BACUS (Technical group), SPIE (Society)
Other Authors:	Behringer, Uwe F. W., Maurer, Wilhelm, Waelpoel, Jacques
Other title:	European Mask and Lithography Conference 2008. 24th European Mask and Lithography Conference. SPIE digital library.
Format:	Electronic Conference Proceeding eBook
Language:	English
Published:	Bellingham, Wash. : SPIE, ©2008.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 6792.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses. Integrated circuits > Masks. Microlithography. Conference papers and proceedings.

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Holdings details from Online
Call Number:	TK7872.M3
TK7872.M3	Available