EMLC 2008 [electronic resource] : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany / Uwe F.W. Behringer, chair/editor ; Wilhelm Maurer, Jacques Waelpoel, program chairs ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS [and others]
Saved in:
| Online Access: |
Full Text (via SPIE Digital Library) |
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| Corporate Authors: | , , , |
| Other Authors: | , , |
| Other title: | European Mask and Lithography Conference 2008. 24th European Mask and Lithography Conference. SPIE digital library. |
| Format: | Electronic Conference Proceeding eBook |
| Language: | English |
| Published: |
Bellingham, Wash. :
SPIE,
©2008.
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 6792. |
| Subjects: |
| Physical Description: | 1 volume (various pagings) : illustrations (some color) ; 28 cm. |
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| Bibliography: | Includes bibliographical references and author index. |
| ISBN: | 9780819469564 0819469564 |
| ISSN: | 0277-786X ; |