26th European Mask and Lithography Conference [electronic resource] : 18-20 January 2010, Grenoble, France / Uwe F.W. Behringer, Wilhelm Maurer, editors ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; sponsored by CEA-LETI Grenoble, AEPI Grenoble Isere, Ville de Grenoble (France) [and] UBC Microelectronics (Germany) ; cooperating organizations, BACUS [and others]

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	European Mask and Lithography Conference Grenoble, France, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik, CEA-Leti-Minatec (Firm), UBC Microelectronics (Firm), SPIE (Society), BACUS (Technical group)
Other Authors:	Behringer, Uwe F. W., Maurer, Wilhelm
Other title:	Twenty-sixth European Mask and Lithography Conference. European Mask and Lithography Conference 2010. EMLC 2010.
Format:	Electronic Conference Proceeding eBook
Language:	English
Published:	Bellingham, Wash. : SPIE, ©2010.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 7545.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses. Integrated circuits > Masks. Microlithography. Conference papers and proceedings.

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Call Number:	TK7872.M3 E97 2010e
TK7872.M3 E97 2010e	Available