Photomask technology 2010 [electronic resource] : 13-16 September 2010, Monterey, California, United States / M. Warren Montgomery, Wilhelm Maurer, editors ; sponsored by BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and], SPIE.
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| Online Access: |
Full Text (via SPIE Digital Library) |
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| Corporate Author: | |
| Other Authors: | , |
| Other title: | Symposium on Photomask Technology. Annual BACUS Symposium on Photomask Technology. BACUS Symposium on Photomask Technology. |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Bellingham, Wash. :
SPIE,
©2010.
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 7823. |
| Subjects: |
Internet
Full Text (via SPIE Digital Library)Online
| Call Number: |
TK7874 .S9274 2010e
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| TK7874 .S9274 2010e | Available |