Lithographic measurement of EUV flare in the 0.3-NA Micro ExposureTool optic at the Advanced Light Source [electronic resource]

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Bibliographic Details
Online Access:	Online Access
Corporate Author:	Lawrence Berkeley National Laboratory (Researcher)
Format:	Government Document Electronic eBook
Language:	English
Published:	Berkeley, Calif. : Oak Ridge, Tenn. : Lawrence Berkeley National Laboratory ; distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy, 2005.
Subjects:	Optical Microscopy. Roughness. Proximity Effect. Advanced Light Source. Optics. Scanning Electron Microscopy.

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Call Number:	E 1.99:lbnl--60543
E 1.99:lbnl--60543	Available