Surface and interface analysis of microelectronic materials processing and growth [electronic resource] : 12-13 October 1989, Santa Clara, California / Leonard J. Brillson, Fred H. Pollak, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations: Center for Advanced Electronic Materials Processing, North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing, University of Wisconsin-Madison, SEMATECH.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Authors:	Society of Photo-Optical Instrumentation Engineers, North Carolina State University. Center for Advanced Electronic Materials Processing, University of Wisconsin--Madison. Engineering Research Center for Plasma-Aided Manufacturing, SEMATECH (Organization)
Other Authors:	Brillson, L. J., Pollak, Fred H.
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, ©1990.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1186.
Subjects:	Microelectronics > Materials > Congresses. Surfaces (Technology) > Analysis > Congresses. Semiconductors > Materials > Congresses. Microelectronics > Materials. Semiconductors > Materials. Surfaces (Technology) > Analysis. Conference papers and proceedings.

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Call Number:	TK7874 .S868 1990
TK7874 .S868 1990	Available