Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V [electronic resource] : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.

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Bibliographic Details
Online Access:	Full Text (via SPIE Digital Library)
Corporate Author:	Society of Photo-Optical Instrumentation Engineers
Other Authors:	Blais, Phillip D.
Other title:	Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies V.
Format:	Electronic eBook
Language:	English
Published:	Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, ©1986.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 632.
Subjects:	Lithography, Electron beam > Congresses. X-ray lithography > Congresses. Ion beam lithography > Congresses. Ion beam lithography. Lithography, Electron beam. X-ray lithography. Conference papers and proceedings.

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Call Number:	TK7874 .E484 1986
TK7874 .E484 1986	Available