Fabrication of micrometer line width SAW filters using direct optical projection / W.J. Kearns, A.J. Slobodnik, Jr.

Projection printing directly on acoustic substrates using a 10X master and a high resolution 10:1 reduction lens in conjunction with the photoresist stripping technique has resulted in successful fabrication of micrometer line-width SAW filters, which are used in command, control, and communications...

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Main Authors: Kearns, W. J. (Author), Slobodnik, A. J., Jr. (Andrew James) (Author)
Corporate Author: Air Force Cambridge Research Laboratories (U.S.)
Format: Government Document Book
Language:English
Published: Hanscom AFB, Massachusetts : Air Force Cambridge Research Laboratories, Air Force Systems Command, United States, 1975.
Series:AFCRL-TR (Series) ; 75-55.
Instrumentation papers ; no. 225.
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Summary:Projection printing directly on acoustic substrates using a 10X master and a high resolution 10:1 reduction lens in conjunction with the photoresist stripping technique has resulted in successful fabrication of micrometer line-width SAW filters, which are used in command, control, and communications and electronic sensing applications. This system and a typical 320 MHz (1.26 micrometer line width) SAW filter are described in detail.
Item Description:"28 January 1975."
ADA008488 (http://www.dtic.mil)
Microwave Physics Laboratory Project 634B.
Research supported by the Air Force Cambridge Research Laboratories, Air Force Systems Command, United States Air Force, L.G. Hanscom Field, Bedford, Massachusetts.
Physical Description:12 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references (pages 11-12)
Action Note:committed to retain 20230101 20480101 Alliance Shared Trust https://www.coalliance.org/shared-print-archiving-policies.