Electromigration in thin films and electronic devices [electronic resource] : materials and reliability / edited by Choong-Un Kim.
Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area. Part on...
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| Online Access: |
Full Text (via ScienceDirect) |
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| Other Authors: | |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Oxford :
Woodhead Pub.,
2011.
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| Series: | Woodhead Publishing in materials.
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| Subjects: |
Internet
Full Text (via ScienceDirect)Online
| Call Number: |
TA418.9.T45 E54 2010eb
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| TA418.9.T45 E54 2010eb | Available |