Plasma etching for CMOS devices realization / edited by Nicolas Posseme.

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Bibliographic Details
Other Authors:	Posseme, Nicolas (Editor)
Format:	Book
Language:	English
Published:	London : Kidlington, Oxford : ISTE Press Ltd ; Elsevier Ltd, 2017.
Series:	Electronics engineering series (London, England)
Subjects:	Metal oxide semiconductors, Complementary > Design and construction. Plasma etching.

Closed Stacks - Engineering Math & Physics Library - Stacks

Holdings details from Closed Stacks - Engineering Math & Physics Library - Stacks
Call Number:	TK7871.99.M44 P63 2017
TK7871.99.M44 P63 2017	Withdrawn