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Stress Induced Phenomena in Metallization : 5th International Workshop, Stuttgart, Germany, June 23-25, 1999.

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Bibliographic Details
Online Access: Full Text (via Scitation)
Other Authors: Kraft, Oliver (Editor), Arzt, Eduard (Editor), Volkert, Cynthia A. (Editor), Ho, Paul S. (Editor), Okabayashi, Hidekazu (Editor)
Format: eBook
Language:English
Published: College Park : Secaucus : American Institute of Physics, Springer [distributor] Oct. 1999 ;
Series:AIP Conference Proceedings Ser. ; vol. 491.
Subjects:
Integrated circuits > Defects > Congresses.
Thin film devices > Defects > Congresses.
Electrodiffusion > Congresses.
Metallic films > Congresses.
Electrochemical metallizing > Congresses.
Aluminum films > Congresses.
Semiconductors > Defects > Congresses.
Liquid crystal devices > Defects > Congresses.
Acoustic surface wave devices > Defects > Congresses.
Aluminum films.
Electrochemical metallizing.
Electrodiffusion.
Integrated circuits > Defects.
Metallic films.
Semiconductors > Defects.
Thin film devices > Defects.
Conference papers and proceedings.
Description
Physical Description:325 pages : illustrations ; 09.250 x 06.375 in.
Audience:Scholarly & Professional
Bibliography:Includes bibliographical references and index.
ISBN:9781563969041
1563969041

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