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Stress-induced phenomena in metallization [electronic resource] : third international workshop, Palo Alto, CA June 1995 / editors, Paul S. Ho [and others]

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Bibliographic Details
Online Access: Full Text (via Scitation)
Corporate Author: International Workshop on Stress-Induced Phenomena in Metallization Stanford University
Other Authors: Ho, P. S.
Format: Electronic Conference Proceeding eBook
Language:English
Published: Woodbury, N.Y. : AIP Press, ©1996.
Series:AIP conference proceedings ; no. 373.
Subjects:
Semiconductors > Defects > Congresses.
Integrated circuits > Defects > Congresses.
Interconnects (Integrated circuit technology) > Defects > Congresses.
Metallic films > Defects > Congresses.
Thin film devices > Defects > Congresses.
Aluminum films > Defects > Congresses.
Metallizing > Congresses.
Electrodiffusion > Congresses.
Description
Summary:Annotation
Physical Description:1 online resource (vii, 304 pages) : illustrations.
Bibliography:Includes bibliographical references and index.
ISBN:1563964392
9781563964398
ISSN:1551-7616 ;
Source of Description, Etc. Note:Print version record.

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