Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing [electronic resource] : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Saved in:
| Online Access: |
Full Text (via SPIE Digital Library) |
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| Corporate Authors: | , |
| Other Authors: | |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Bellingham, Wash. :
SPIE,
©1991.
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 1465. |
| Subjects: |
Internet
Full Text (via SPIE Digital Library)Online
| Call Number: |
TK7874 .E4818 1991
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| TK7874 .E4818 1991 | Available |